Laboratories
The Laboratory of Plasmas, Films, and Surfaces Laboratory was founded in 1999. During this period, it has been dedicated mainly to studies of cold plasma applications, in particular, in surface treatment and thin film deposition. It has also been working on studies on the generation and characterization of electrical discharges. The laboratory is associated with the Plasma Group and contributes not only to the Physics Graduate Program but also to the Materials Science and Applied Chemistry programs since the group brings together researchers from different areas.
The lab infrastructure consists of
• Magnetron sputtering system for film deposition;
• Plasma reactor for thermochemical treatments (nitridation, oxidation, ...);
• Plasma reactor for polimerization and surface functionalization;
• Plasma reactor for carbon nanotube treatment;
• Plasma reactor for basic studies;
Some multiusuary facilites are also installed in the laboratory as
• Ramé-Hart goniometer for surface energy and wettability studies;
• Hall effect measurement system (Ecopia) of electrical properties by van der Pauw method;
• X-Ray Photoelectron Spectrometer (XPS) (Thermo Scientific K-Alpha) .
The laboratory meets the high-performance computing needs of the Nonlinear Dynamics and Nonlinear Dynamical Systems research group. The lab has been updated with equipment from current generations to develop research with high scientific impact and always be at the forefront of national research.
The Laboratory of Nonlinear Electronic Circuits is dedicated to the study of experimental chaos, more specifically to the study of nonlinear electronic circuits that may have chaotic dynamics.
This laboratory gives experimental support to theoretical-computational studies developed by the research group on the theme of nonlinear electronic circuits. The current infrastructure consists of:
• One National Instruments data acquisition card, PCIE-6259 M Series, with BNC-2090ª Connector Block accessories, with Labview software and two dedicated computers;
• Keithley bench digital multimeter 6 ½ digits DMM model 2100;
• Two symmetric sources ICEL PS5000;
• Hikari HM 2900 digital multimeter;
• ICEL LC-301 Capacitor / Inductimeter;
• SMD rework station HK-850;
• Soldering station with controlled temperature;
• Hikari HK-700ESD bench smoke hood;
• One Tektronix TDS 2024 200MHz oscilloscope with computer interface;
• CNC router for making printed circuit boards;
• Electrometer system composed of a High voltage source meter, a programmable triple channel DC power supply and accessories, Keithley brand, models 2410 and 2230-30-1.
The computational laboratory of the Group of Condensed Matter Theoretical Physics has an approximate area of 27 m². Space has ten benches, with appropriate electrical installation, for use by master's and undergraduate students linked to the group. The group's computer resources currently include:
• two Z390 Workstations - Octa-core i7-9700K, 16GB DDR4, with 120MM PWC120H40PTSL acceleration Kit;
• three ASUS Z370 WORKSTATIONs - Hexacore 8400, 8GB, DDR4, SSD 240GB;
• an NHS Premium PDV GII Sinusoidal 1000VA / 600W Bivolt UPS with Bat. Sealed 2X17Ah;
• three servers with an Intel Xeon processor with four 3.3 GHz cores;
• three desktops with fourth-generation i5 processors;
• three Acer E5 571G notebooks with i7 processors;
• two Positivo microcomputers with i5 processors;
• two EPSON Ecotank printers.
In the Laboratory of Thins Films, depositions of hydrogenated amorphous silicon and carbon films are carried out. The objective is to study the structural, optical, and surface properties of these materials to use them as protective coatings for surfaces in general. For this, the following equipment is available:
• PECVD reactor;
• Two goniometers for measuring contact angle;
• A Leika DCM 3D confocal microscope;
• Complete Raman Spectrometry System, Bruker FT model - Raman Spectrometer MultiRam;
• Bruker Dektak XT profilometry system;
We also have access to other facilities on the campus:
1) Graduate Program in Materials Science and Engineering:
• Scanning Electron Microscope – Zeiss DSM 940 and EDS analyzer coupled to the SEM; Baltec SCD 050 Metallizer;
• Transmission Electron Microscope;
• Scanning electron microscope with field effect emission (FEG);
• Atomic force microscope;
• Nanoidentator;
• X-Ray Diffractometer - Shimadzu XRD 600;
• Thermal Analysis Equipment (TGA, DTA and DSC) - Netzsch STA 449C; Dilatometer – Netzsch;
• Infrared Spectrophotometer - Perkin Elmer Spectrum One B;
• UV/Visible Emission Spectrometer – Shimadzu;
• Microdurometer – Shimadzu;
Vickers, Brinell, and Rockwell Universal Durometers;
• 200 kN Universal Mechanical Testing Machine – EMIC; 50 kN press; - Impact machine for Charpy type polymers; Three-point creep and bending test machine, 1000 N capacity; DSM extrusion plastometer, model MI-2;
• Optical microscopes with an image analyzer.
2) Graduate Program in Applied Chemistry:
• UV-Vis spectrometer for reflectance and transmittance measurements;
• Nuclear magnetic resonance;
• Chromatograph.
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